|Fraunhofer IAF Selects GEN200 MBE for Optoelectronic Device Production|
According to Dr.
About the GEN200 MBE System
The GEN200 is the most cost-effective and highest capacity multi-4” production MBE system in the market today. The system delivers superior throughput, long campaigns and excellent wafer quality in growing GaAs or InP-based wafers for such devices as pump lasers, VCSELs and HBTs. For more information please visit www.veeco.com/GEN200.
About the Fraunhofer IAF
The Fraunhofer IAF develops electrical and optical devices based on compound semiconductors. The Institute was founded in 1957 and is one of the world’s leading research facilities in the field of III-V semiconductors. Fraunhofer IAF employs over 280 people in an entire spectrum of areas: from analysis of materials and design to the realization of modules and systems. The technologies of the Fraunhofer IAF are used in various fields of application, like security, energy, communication, health and mobility. The Institute has approximately 170 partners in industry and research. For more information please visit http://www.iaf.fraunhofer.de/en.html
Veeco’s process equipment solutions enable the manufacture of LEDs, power electronics, hard drives, MEMS and wireless chips. We are the market leader in MOCVD, MBE, Ion Beam and other advanced thin film process technologies. Our high performance systems drive innovation in energy efficiency, consumer electronics and network storage and allow our customers to maximize productivity and achieve lower cost of ownership. For information on our company, products and worldwide service and support, please visit www.veeco.com.
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